Cite
HARVARD Citation
Choi, J. et al. (2016). Highly anisotropic etching of Ta thin films using high density plasmas of halogen based gases. Vacuum. pp. 18-24. [Online].
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Choi, J. et al. (2016). Highly anisotropic etching of Ta thin films using high density plasmas of halogen based gases. Vacuum. pp. 18-24. [Online].