Diffusivity of the double negatively charged mono-vacancy in silicon. (10th April 2017)
- Record Type:
- Journal Article
- Title:
- Diffusivity of the double negatively charged mono-vacancy in silicon. (10th April 2017)
- Main Title:
- Diffusivity of the double negatively charged mono-vacancy in silicon
- Authors:
- Bhoodoo, Chidanand
Vines, Lasse
Monakhov, Edouard
Gunnar Svensson, Bengt - Abstract:
- Abstract: Lightly-doped silicon (Si) samples of n -type conductivity have been irradiated with 2.0 MeV H + ions at a temperature of 30 K and characterized in situ by deep level transient spectroscopy (DLTS) measurements using an on-line setup. Migration of the Si mono-vacancy in its double negative charge state ( V 2− ) starts to occur at temperatures above ∼70 K and is monitored via trapping of V 2− by interstitial oxygen impurity atoms ( O i ), leading to the growth of the prominent vacancy-oxygen ( V O ) center. The V O center gives rise to an acceptor level located at ∼0.17 eV below the conduction band edge ( E c ) and is readily detected by DLTS measurements. Post-irradiation isothermal anneals at temperatures in the range of 70 to 90 K reveal first-order kinetics for the reaction V 2 − + O i → V O ( + 2 e − ) in both Czochralski-grown and Float-zone samples subjected to low fluences of H + ions, i.e. the irradiation-induced V concentration is dilute ( ⩽ 10 13 cm −3 ). On the basis of these kinetics data and the content of O i, the diffusivity of V 2− can be determined quantitatively and is found to exhibit an activation energy for migration of ∼0.18 eV with a pre-exponential factor of ∼ 4 × 10 − 3 cm 2 s −1 . The latter value evidences a simple jump process without any entropy effects for the motion of V 2− . No deep level in the bandgap to be associated with V 2− is observed but the results suggest that the level is situated deeper than ∼0.19 eVAbstract: Lightly-doped silicon (Si) samples of n -type conductivity have been irradiated with 2.0 MeV H + ions at a temperature of 30 K and characterized in situ by deep level transient spectroscopy (DLTS) measurements using an on-line setup. Migration of the Si mono-vacancy in its double negative charge state ( V 2− ) starts to occur at temperatures above ∼70 K and is monitored via trapping of V 2− by interstitial oxygen impurity atoms ( O i ), leading to the growth of the prominent vacancy-oxygen ( V O ) center. The V O center gives rise to an acceptor level located at ∼0.17 eV below the conduction band edge ( E c ) and is readily detected by DLTS measurements. Post-irradiation isothermal anneals at temperatures in the range of 70 to 90 K reveal first-order kinetics for the reaction V 2 − + O i → V O ( + 2 e − ) in both Czochralski-grown and Float-zone samples subjected to low fluences of H + ions, i.e. the irradiation-induced V concentration is dilute ( ⩽ 10 13 cm −3 ). On the basis of these kinetics data and the content of O i, the diffusivity of V 2− can be determined quantitatively and is found to exhibit an activation energy for migration of ∼0.18 eV with a pre-exponential factor of ∼ 4 × 10 − 3 cm 2 s −1 . The latter value evidences a simple jump process without any entropy effects for the motion of V 2− . No deep level in the bandgap to be associated with V 2− is observed but the results suggest that the level is situated deeper than ∼0.19 eV below E c, corroborating results reported previously in the literature. … (more)
- Is Part Of:
- Journal of physics. Volume 29:Number 20(2017)
- Journal:
- Journal of physics
- Issue:
- Volume 29:Number 20(2017)
- Issue Display:
- Volume 29, Issue 20 (2017)
- Year:
- 2017
- Volume:
- 29
- Issue:
- 20
- Issue Sort Value:
- 2017-0029-0020-0000
- Page Start:
- Page End:
- Publication Date:
- 2017-04-10
- Subjects:
- mono-vacancy -- silicon -- thermal migration -- DLTS -- ion implantation -- diffusivity
Condensed matter -- Periodicals
Matière condensée -- Périodiques
Vaste stoffen
Vloeistoffen
Natuurkunde
Electronic journals
Computer network resources
530.4105 - Journal URLs:
- http://www.iop.org/Journals/cm ↗
http://iopscience.iop.org/0953-8984/ ↗
http://ioppublishing.org/ ↗ - DOI:
- 10.1088/1361-648X/aa693f ↗
- Languages:
- English
- ISSNs:
- 0953-8984
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 14509.xml