Photoresist Films: Freestanding Photoresist Film: A Versatile Template for Three‐Dimensional Micro‐ and Nanofabrication (Adv. Funct. Mater. 42/2020). (16th October 2020)

• Record Type: Journal Article
• Authors: Liu, Yuyang; Du, Ke; Wathuthanthri, Ishan; Xu, Wei; Choi, Chang‐Hwan
• Is Part Of: Advanced functional materials. Volume 30:Number 42(2020)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2020-10-16
• Subjects: 3D nanofabrication -- photoresist films -- scaffolds -- self‐delamination -- stencils; Materials -- Periodicals; Chemical vapor deposition -- Periodicals; 620.11
• DOI: 10.1002/adfm.202070277
• Languages: English
• ISSNs: 1616-301X

Abstract

Abstract : In article number 2004129, Chang‐Hwan Choi and co‐workers introduce a novel sacrificial‐layer‐free lifting‐off process that can release a pre‐patterned photoresist film from a supporting substrate, leveraging the formation of bubbles at the interface during the decomposition of hydrogen peroxide solution. The flexible and durable freestanding film with lithographically defined features can serve as a versatile platform such as template, stencil, and scaffold for rapid, scalable, and robust 3D micro‐ and nanofabrication.