Characterization of the deposition behavior and changes in bonding structures of hexamethyldisiloxane and decamethylcyclopentasiloxane atmospheric plasma‐deposited films*. Issue 7 (12th April 2019)
- Record Type:
- Journal Article
- Title:
- Characterization of the deposition behavior and changes in bonding structures of hexamethyldisiloxane and decamethylcyclopentasiloxane atmospheric plasma‐deposited films*. Issue 7 (12th April 2019)
- Main Title:
- Characterization of the deposition behavior and changes in bonding structures of hexamethyldisiloxane and decamethylcyclopentasiloxane atmospheric plasma‐deposited films*
- Authors:
- Gilliam, Mary A.
Farhat, Susan A.
Garner, Graham E.
Stubbs, Barrack P.
Peterson, Benjamin B. - Abstract:
- Abstract: The plasma deposition behavior of hexamethyldisiloxane (HMDSO) and decamethylcyclopentasiloxane (D5) is investigated for an atmospheric pressure plasma jet. The energy‐deficient and monomer‐deficient domains are revealed by normalized parameters and no significant difference between HMDSO and D5 is observed. The results are supported by Fourier‐transform infrared spectroscopy (FTIR) and X‐ray photoelectron spectroscopy. The data is also evaluated using an Arrhenius‐type equation and an empirical equation reported in the literature, but the correlation is not as good as the normalized parameters. Changes in Si–O–Si bonding arrangements are analyzed by deconvolution of the FTIR absorbance band, showing an increase in porous cage structures with higher normalized energy input. Abstract : Deposition characterization of two organosilicon precursors in atmospheric plasma reveals the energy‐deficient and monomer‐deficient domains. Changes in Si–O–Si bonding structures are observed using Fourier‐transform infrared spectroscopy and correlate to the energy domains. Cross‐linked network structures are more abundant in the energy‐deficient domain, while more porous cage structures are formed in the monomer‐deficient domain.
- Is Part Of:
- Plasma processes and polymers. Volume 16:Issue 7(2019)
- Journal:
- Plasma processes and polymers
- Issue:
- Volume 16:Issue 7(2019)
- Issue Display:
- Volume 16, Issue 7 (2019)
- Year:
- 2019
- Volume:
- 16
- Issue:
- 7
- Issue Sort Value:
- 2019-0016-0007-0000
- Page Start:
- n/a
- Page End:
- n/a
- Publication Date:
- 2019-04-12
- Subjects:
- deposition characterization -- infrared spectroscopy -- organosilicon precursors -- plasma polymerization -- plasma‐enhanced chemical vapor deposition
Plasma polymerization -- Periodicals
Plasma-enhanced chemical vapor deposition -- Periodicals
Plasma chemistry -- Periodicals - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1612-8869 ↗
http://www3.interscience.wiley.com/cgi-bin/jtoc/106571203 ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/ppap.201900024 ↗
- Languages:
- English
- ISSNs:
- 1612-8850
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 6528.781000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 14237.xml