Cite
HARVARD Citation
Marchack, N. et al. (2019). Utilizing surface modification in plasma‐enhanced cyclic etching of tantalum nitride to surpass lithographic limits. Plasma processes and polymers. 16 (9), p. n/a. [Online].
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Marchack, N. et al. (2019). Utilizing surface modification in plasma‐enhanced cyclic etching of tantalum nitride to surpass lithographic limits. Plasma processes and polymers. 16 (9), p. n/a. [Online].