Thin film growth of CaAgAs by molecular beam epitaxy. (4th August 2020)

• Record Type: Journal Article
• Authors: Hatano, T; Nakamura, I; Ohta, S; Tomizawa, Y; Urata, T; Iida, K; Ikuta, H
• Is Part Of: Journal of physics. Volume 32:Number 43(2020)
• Publication Date: 2020-08-04
• Subjects: topological insulator -- weak antilocalization -- molecular beam epitaxy; Condensed matter -- Periodicals; Matière condensée -- Périodiques; Vaste stoffen; Vloeistoffen; Natuurkunde; Electronic journals; Computer network resources; 530.4105
• DOI: 10.1088/1361-648X/aba6a7
• Languages: English
• ISSNs: 0953-8984

Abstract

Abstract: We have grown thin films of CaAgAs by molecular beam epitaxy, which was theoretically proposed to be a topological insulator. The temperature dependence of resistivity and the carrier concentration at 4 K were similar to the reported results of bulk samples. However, the magnetoresistance exhibited a steep increase at low magnetic fields, a behavior not observed for bulk samples. This steep increase of resistivity is ascribable to the weak antilocalization effect and provides clues to the nature of the topological surface state of CaAgAs.