Coulomb scattering mechanism transition in 2D layered MoTe2: effect of high-κ passivation and Schottky barrier height. (16th November 2018)
- Record Type:
- Journal Article
- Title:
- Coulomb scattering mechanism transition in 2D layered MoTe2: effect of high-κ passivation and Schottky barrier height. (16th November 2018)
- Main Title:
- Coulomb scattering mechanism transition in 2D layered MoTe2: effect of high-κ passivation and Schottky barrier height
- Authors:
- Joo, Min-Kyu
Yun, Yoojoo
Ji, Hyunjin
Suh, Dongseok - Abstract:
- Abstract: Clean interface and low contact resistance are crucial requirements in two-dimensional (2D) materials to preserve their intrinsic carrier mobility. However, atomically thin 2D materials are sensitive to undesired Coulomb scatterers such as surface/interface adsorbates, metal-to-semiconductor Schottky barrier (SB), and ionic charges in the gate oxides, which often limits the understanding of the charge scattering mechanism in 2D electronic systems. Here, we present the effects of hafnium dioxide (HfO2 ) high- κ passivation and SB height on the low-frequency (LF) noise characteristics of multilayer molybdenum ditelluride (MoTe2 ) transistors. The passivated HfO2 passivation layer significantly suppresses the surface reaction and enhances dielectric screening effect, resulting in an excess electron n -doping, zero hysteresis, and substantial improvement in carrier mobility. After the high- κ HfO2 passivation, the obtained LF noise data appropriately demonstrates the transition of the Coulomb scattering mechanism from the SB contact to the channel, revealing the significant SB noise contribution to the 1/ f noise. The substantial excess LF noise in the subthreshold regime is mainly attributed to the excess metal-to-MoTe2 SB noise and is fully eliminated at the high drain bias regime. This study provides a clear insight into the origin of electronic signal perturbation in 2D electronic systems.
- Is Part Of:
- Nanotechnology. Volume 30:Number 3(2019)
- Journal:
- Nanotechnology
- Issue:
- Volume 30:Number 3(2019)
- Issue Display:
- Volume 30, Issue 3 (2019)
- Year:
- 2019
- Volume:
- 30
- Issue:
- 3
- Issue Sort Value:
- 2019-0030-0003-0000
- Page Start:
- Page End:
- Publication Date:
- 2018-11-16
- Subjects:
- molybdenum ditelluride -- high-κ passivation -- Schottky barrier height -- Coulomb screening -- low-frequency noise
Nanotechnology -- Periodicals
Nanotechnology -- Periodicals
Nanotechnology
Publications périodiques
Nanotechnologies
Periodicals
620.5 - Journal URLs:
- http://www.iop.org/Journals/na ↗
http://iopscience.iop.org/0957-4484/ ↗
http://ioppublishing.org/ ↗ - DOI:
- 10.1088/1361-6528/aae99c ↗
- Languages:
- English
- ISSNs:
- 0957-4484
- Deposit Type:
- Legaldeposit
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- Available online (eLD content is only available in our Reading Rooms) ↗
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