Radiation Defects Created in n‐Type 4H‐SiC by Electron Irradiation in the Energy Range of 1–10 MeV. Issue 17 (24th July 2019)

• Record Type: Journal Article
• Authors: Hazdra, Pavel; Vobecký, Jan
• Other Names: Kissinger Gudrun guestEditor.; Kot Dawid guestEditor.; Richter Hans guestEditor.; Zöllner Marvin guestEditor.
• Is Part Of: Physica status solidi. Volume 216:Issue 17(2019)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2019-07-24
• Subjects: electron irradiation -- lifetime control -- radiation defects -- silicon carbide; Solid state physics -- Periodicals; Solids -- Industrial applications -- Periodicals; 530.41
• DOI: 10.1002/pssa.201900312
• Languages: English
• ISSNs: 1862-6300

Abstract

Abstract : Radiation damage produced in 4H‐SiC n ‐epilayers by electrons of different energies is presented. Junction barrier Schottky power SiC diodes are irradiated with 1.05, 2.1, 5, and 10 MeV electrons with doses up to 600 kGy. Radiation defects are characterized by capacitance deep‐level transient spectroscopy and capacitance‐to‐voltage ( C – V ) measurement. Results, which are compared with previous data obtained on 4.5 MeV electrons, show that the damage structure is very similar for all irradiation energies. Dominating is the generation of simple, thermally unstable defects evidenced by the presence of acceptor levels located at 0.25, 0.38, 0.60, and 0.72 eV below the 4H‐SiC conduction band edge. With increasing energy of electrons, the number of simple defects saturates, and the production of more complex, cluster‐related defects grow. Majority of introduced defects are acceptor centers, which compensate n ‐type (nitrogen) doping of the epilayer. The carrier removal rate increases with electron energy and follows well the classical nonionization energy loss (NIEL) scaling for electrons in silicon. The stability of introduced defects and their effect on carrier lifetime reduction are discussed, as well. Abstract : Radiation damage in 4H‐SiC produced by 1.05–10 MeV electrons is investigated by deep‐level transient spectroscopy. Introduced damage is very similar in the whole energy spectrum; however, with increasing energy, the number of simple defects saturates, and the amount of defect clusters grows. The carrier removal rate caused by the introduced acceptor centers follows well the classical nonionization energy loss scaling.