Investigation of diamond deposition on the diamond, silicon and quartz substrates by microwave plasma chemical vapor deposition and Monte Carlo simulations. (10th July 2019)
- Record Type:
- Journal Article
- Title:
- Investigation of diamond deposition on the diamond, silicon and quartz substrates by microwave plasma chemical vapor deposition and Monte Carlo simulations. (10th July 2019)
- Main Title:
- Investigation of diamond deposition on the diamond, silicon and quartz substrates by microwave plasma chemical vapor deposition and Monte Carlo simulations
- Authors:
- Reshi, Bilal Ahmad
Kartha, Moses J
Misra, Anuradha
Varma, Raghava - Abstract:
- Abstract: In this paper, a growth mechanism of diamond utilizing Microwave plasma chemical vapor deposition (MPCVD) on various substrates alongside Monte-Carlo simulations is presented for the first time. The values of roughness exponent ( α ) have been estimated on diamond, silicon and quartz substrates while as the growth exponent ( β ) is found out through the grown diamond film on a diamond substrate. The roughness exponent has been investigated by evaluating the height-height correlation function for the diamond interface. For diamond, silicon, and quartz the roughness exponent α is found to be 0.42, 0.21 and 0.25 respectively. The value of α < 0.5 suggests that diamond deposited on silicon and quartz surface has more gagged surface than the diamond deposited on diamond substrates. It has been investigated that the growth exponent β = 0.45 ± 0.18 is dominated by random deposition with diffusion during the growth process. Monte-Carlo simulation with varying sticking probability p has been carried out in order to reconstruct the interface obtained in experiments. It is found that β decreases with sticking probability p. The interface reconstructed through simulations for this sticking probability shows voids and vacancies during the deposition. Raman spectra and x-ray Photoelectron Spectroscopy (XPS) study confirm the diamond phase of carbon (sp 3 ) is present in the grown films. The diamond grown in the setup used for this study exhibits crystalline nature andAbstract: In this paper, a growth mechanism of diamond utilizing Microwave plasma chemical vapor deposition (MPCVD) on various substrates alongside Monte-Carlo simulations is presented for the first time. The values of roughness exponent ( α ) have been estimated on diamond, silicon and quartz substrates while as the growth exponent ( β ) is found out through the grown diamond film on a diamond substrate. The roughness exponent has been investigated by evaluating the height-height correlation function for the diamond interface. For diamond, silicon, and quartz the roughness exponent α is found to be 0.42, 0.21 and 0.25 respectively. The value of α < 0.5 suggests that diamond deposited on silicon and quartz surface has more gagged surface than the diamond deposited on diamond substrates. It has been investigated that the growth exponent β = 0.45 ± 0.18 is dominated by random deposition with diffusion during the growth process. Monte-Carlo simulation with varying sticking probability p has been carried out in order to reconstruct the interface obtained in experiments. It is found that β decreases with sticking probability p. The interface reconstructed through simulations for this sticking probability shows voids and vacancies during the deposition. Raman spectra and x-ray Photoelectron Spectroscopy (XPS) study confirm the diamond phase of carbon (sp 3 ) is present in the grown films. The diamond grown in the setup used for this study exhibits crystalline nature and long-range order as suggested Raman spectroscopy. … (more)
- Is Part Of:
- Materials research express. Volume 6:Number 9(2019)
- Journal:
- Materials research express
- Issue:
- Volume 6:Number 9(2019)
- Issue Display:
- Volume 6, Issue 9 (2019)
- Year:
- 2019
- Volume:
- 6
- Issue:
- 9
- Issue Sort Value:
- 2019-0006-0009-0000
- Page Start:
- Page End:
- Publication Date:
- 2019-07-10
- Subjects:
- diamond thin films -- microwave plasma chemical vapour deposition -- growth exponent -- roughness exponent
Materials science -- Research -- Periodicals
Materials science -- Periodicals
620.11 - Journal URLs:
- http://ioppublishing.org/ ↗
http://iopscience.iop.org/2053-1591/ ↗ - DOI:
- 10.1088/2053-1591/ab2e8e ↗
- Languages:
- English
- ISSNs:
- 2053-1591
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 14162.xml