Powder free PECVD epitaxial silicon by plasma pulsing or increasing the growth temperature. (16th May 2018)

• Record Type: Journal Article
• Authors: Chen, Wanghua; Maurice, Jean-Luc; Vanel, Jean-Charles; Roca i Cabarrocas, Pere
• Is Part Of: Journal of physics. Volume 51:Number 23(2018)
• Publication Date: 2018-05-16
• Subjects: PECVD -- powder free -- plasma pulsing; Physics -- Periodicals; 530
• DOI: 10.1088/1361-6463/aac1ea
• Languages: English
• ISSNs: 0022-3727

Abstract

Abstract: Crystalline silicon thin films are promising candidates for low cost and flexible photovoltaics. Among various synthesis techniques, epitaxial growth via low temperature plasma-enhanced chemical vapor deposition is an interesting choice because of two low temperature related benefits: low thermal budget and better doping profile control. However, increasing the growth rate is a tricky issue because the agglomeration of clusters required for epitaxy leads to powder formation in the plasma. In this work, we have measured precisely the time evolution of the self-bias voltage in silane/hydrogen plasmas at millisecond time scale, for different values of the direct-current bias voltage applied to the radio frequency (RF) electrode and growth temperatures. We demonstrate that the decisive factor to increase the epitaxial growth rate, i.e. the inhibition of the agglomeration of plasma-born clusters, can be obtained by decreasing the RF OFF time or increasing the growth temperature. The influence of these two parameters on the growth rate and epitaxial film quality is also presented.