Polyvinyl alcohol: a high-resolution hydrogel resist for humidity-sensitive micro-/nanostructure. (24th July 2020)

• Record Type: Journal Article
• Authors: Zhang, Jian; Huang, Chao; Chen, Yingxin; Wang, Hu; Gong, Zhongmiao; Chen, Weiqian; Ge, Haixiong; Hu, Xin; Zhang, Xuefeng
• Is Part Of: Nanotechnology. Volume 31:Number 42(2020)
• Publication Date: 2020-07-24
• Subjects: hydrogel nanostructure -- electron beam lithography -- high resolution -- polyvinyl alcohol -- humidity responsivity; Nanotechnology -- Periodicals; Nanotechnology -- Periodicals; Nanotechnology; Publications périodiques; Nanotechnologies; Periodicals; 620.5
• DOI: 10.1088/1361-6528/ab9da7
• Languages: English
• ISSNs: 0957-4484

Abstract

Abstract: A high-resolution nanopatterning technique is desirable with the present rapid development of hydrogel nanodevices. Here, we demonstrate that polyvinyl alcohol (PVA), a popular polymeric hydrogel, can function as the negative-tone resist for electron beam lithography (EBL) with a resolution capability as narrow as 50 nm half-pitch. Furthermore, the hydrophilic groups of PVA are stable after EBL exposure, and thus the pattern still shows rapid responsivity to humidity change. An aqueous nanopatterning process including dissolution, spin-coating and development is setup, which is friendly for organic device fabrication free of organic solvent. This high-resolution nanopatterning technique with PVA is helpful for the design and realization of hydrogel-related nanodevices in the future.