Cite
HARVARD Citation
Velardi, L. et al. (2020). Nickel doped TiO2 films by a modified laser plasma source for photocatalytic applications. Journal of instrumentation. p. C03039. [Online].
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Velardi, L. et al. (2020). Nickel doped TiO2 films by a modified laser plasma source for photocatalytic applications. Journal of instrumentation. p. C03039. [Online].