Active tuning of Mie resonances to realize sensitive photothermal measurement of single nanoparticles. Issue 6 (9th April 2020)

• Record Type: Journal Article
• Authors: Yan, Jiahao; Li, Yuchao; Lou, Zaizhu; Ma, Churong; Yang, Guowei; Li, Baojun
• Is Part Of: Materials horizons. Volume 7:Issue 6(2020)
• Page Start: 1542
• Page End: 1551
• Publication Date: 2020-04-09
• Subjects: Materials -- Research -- Periodicals; 543.0284
• DOI: 10.1039/d0mh00311e
• Languages: English
• ISSNs: 2051-6347

Abstract

Abstract : High-index all-dielectric nanostructures with Mie-type resonances have promising applications in building optical nanodevices and metasurfaces. Abstract : High-index all-dielectric nanostructures with Mie-type resonances have promising applications in building optical nanodevices and metasurfaces. Very recently, great efforts have been made to explore the effective active tuning of Mie-type magnetic resonances via applied voltages, heating, etc. for more sensitive optoelectronic and photothermal applications. Here, we constructed a new platform containing vanadium dioxide (VO2 ) films and tungsten disulfide (WS2 ) flakes to realize distinctive active tuning of the collective Mie resonances from silicon nanoparticle (Si NP) clusters and measure the resonance-enhanced local heating precisely. Through increasing the thickness of WS2, we found new type active spectral evolution with high sensitivity during the phase change of VO2 . The temperature increase caused by local heating of different Si NP clusters can be determined through both scattering and photoluminescence (PL) measurements with the best thermal resolution less than 1 °C. The proposed platform provides a new way to enhance the active tuning of Mie resonance and detect the local heating sensitively. More importantly, we propose a new mechanism for measuring the photothermal effects of single dielectric nanoparticles for future energy and biomedical applications.