Cite
HARVARD Citation
Ilhom, S. et al. (2020). Elucidating the role of nitrogen plasma composition in the low-temperature self-limiting growth of indium nitride thin films. RSC advances. 10 (46), pp. 27357-27368. [Online].
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Ilhom, S. et al. (2020). Elucidating the role of nitrogen plasma composition in the low-temperature self-limiting growth of indium nitride thin films. RSC advances. 10 (46), pp. 27357-27368. [Online].