A comprehensive investigation of MoO3 based resistive random access memory. Issue 33 (20th May 2020)
- Record Type:
- Journal Article
- Title:
- A comprehensive investigation of MoO3 based resistive random access memory. Issue 33 (20th May 2020)
- Main Title:
- A comprehensive investigation of MoO3 based resistive random access memory
- Authors:
- Fatheema, Jameela
Shahid, Tauseef
Mohammad, Mohammad Ali
Islam, Amjad
Malik, Fouzia
Akinwande, Deji
Rizwan, Syed - Abstract:
- Abstract : The bipolar resistive switching of molybdenum oxide is deliberated while molybdenum and nickel are used as bottom and top electrodes, respectively, to present a device with resistive random access memory (RRAM) characteristics. Abstract : The bipolar resistive switching of molybdenum oxide is deliberated while molybdenum and nickel are used as bottom and top electrodes, respectively, to present a device with resistive random access memory (RRAM) characteristics. For the trilayered structure, the SET voltage lies around 3.3 V and RESET voltage is observed to be in the −2.3 V to −2.7 V range. The conduction mechanism has been observed and revealed for the Metal–Insulator–Metal (MIM) structure which is a space-charge-limited current mechanism that follows both ohmic conduction and Child's law. Furthermore, a theoretical study has been performed by using density functional theory (DFT) to evaluate the resistance switching role of molybdenum oxide (MoO3 ). The structure has been studied with oxygen vacancy sites induced into the system which shows the reduction in bandgap, whereas an indirect bandgap of 1.9 eV and a direct bandgap of 3.1 eV are calculated for molybdenum oxide. Conclusively, the formation of a conduction filament which is fundamental for resistive switching has been explained through band structure and density of states per eV for oxygen vacancy structures of molybdenum oxide. The current work presents an in-depth understanding of the resistiveAbstract : The bipolar resistive switching of molybdenum oxide is deliberated while molybdenum and nickel are used as bottom and top electrodes, respectively, to present a device with resistive random access memory (RRAM) characteristics. Abstract : The bipolar resistive switching of molybdenum oxide is deliberated while molybdenum and nickel are used as bottom and top electrodes, respectively, to present a device with resistive random access memory (RRAM) characteristics. For the trilayered structure, the SET voltage lies around 3.3 V and RESET voltage is observed to be in the −2.3 V to −2.7 V range. The conduction mechanism has been observed and revealed for the Metal–Insulator–Metal (MIM) structure which is a space-charge-limited current mechanism that follows both ohmic conduction and Child's law. Furthermore, a theoretical study has been performed by using density functional theory (DFT) to evaluate the resistance switching role of molybdenum oxide (MoO3 ). The structure has been studied with oxygen vacancy sites induced into the system which shows the reduction in bandgap, whereas an indirect bandgap of 1.9 eV and a direct bandgap of 3.1 eV are calculated for molybdenum oxide. Conclusively, the formation of a conduction filament which is fundamental for resistive switching has been explained through band structure and density of states per eV for oxygen vacancy structures of molybdenum oxide. The current work presents an in-depth understanding of the resistive switching mechanism involved in MoO3 based resistive random access memory devices for future data storage applications. … (more)
- Is Part Of:
- RSC advances. Volume 10:Issue 33(2020)
- Journal:
- RSC advances
- Issue:
- Volume 10:Issue 33(2020)
- Issue Display:
- Volume 10, Issue 33 (2020)
- Year:
- 2020
- Volume:
- 10
- Issue:
- 33
- Issue Sort Value:
- 2020-0010-0033-0000
- Page Start:
- 19337
- Page End:
- 19345
- Publication Date:
- 2020-05-20
- Subjects:
- Chemistry -- Periodicals
540.5 - Journal URLs:
- http://pubs.rsc.org/en/Journals/JournalIssues/RA ↗
http://www.rsc.org/ ↗ - DOI:
- 10.1039/d0ra03415k ↗
- Languages:
- English
- ISSNs:
- 2046-2069
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 8036.750300
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 13847.xml