The effect of post-deposition annealing conditions on structural and thermoelectric properties of sputtered copper oxide films. Issue 49 (12th August 2020)
- Record Type:
- Journal Article
- Title:
- The effect of post-deposition annealing conditions on structural and thermoelectric properties of sputtered copper oxide films. Issue 49 (12th August 2020)
- Main Title:
- The effect of post-deposition annealing conditions on structural and thermoelectric properties of sputtered copper oxide films
- Authors:
- Abinaya, Chandrasekaran
Bethke, Kevin
Andrei, Virgil
Baumann, Jonas
Pollakowski-Herrmann, Beatrix
Kanngießer, Birgit
Beckhoff, Burkhard
Vásquez, G. Cristian
Mayandi, Jeyanthinath
Finstad, Terje G.
Rademann, Klaus - Abstract:
- Abstract : This study reveals the interplay between the composition and thermoelectric performance of mixed copper oxide thin films, which can be finely adjusted by varying the annealing atmosphere. Abstract : The development of thin-film thermoelectric applications in sensing and energy harvesting can benefit largely from suitable deposition methods for earth-abundant materials. In this study, p-type copper oxide thin films have been prepared on soda lime silicate glass by direct current (DC) magnetron sputtering at room temperature from a pure copper metallic target in an argon atmosphere, followed by subsequent annealing steps at 300 °C under various atmospheres, namely air (CuO:air), nitrogen (CuO:N) and oxygen (CuO:O). The resultant films have been studied to understand the influence of various annealing atmospheres on the structural, spectroscopic and thermoelectric properties. X-ray diffraction (XRD) patterns of the films showed reflexes that could be assigned to those of crystalline CuO with a thin mixed Cu (I) Cu (II) oxide, which was also observed by near edge X-ray absorption fine structure spectroscopy (NEXAFS). The positive Seebeck coefficient ( S ) reached values of up to 204 μV K −1, confirming the p-type behavior of the films. Annealing under oxygen provided a significant improvement in the electrical conductivity up to 50 S m −1, resulting in a power factor of 2 μW m −1 K −2 . The results reveal the interplay between the intrinsic composition and theAbstract : This study reveals the interplay between the composition and thermoelectric performance of mixed copper oxide thin films, which can be finely adjusted by varying the annealing atmosphere. Abstract : The development of thin-film thermoelectric applications in sensing and energy harvesting can benefit largely from suitable deposition methods for earth-abundant materials. In this study, p-type copper oxide thin films have been prepared on soda lime silicate glass by direct current (DC) magnetron sputtering at room temperature from a pure copper metallic target in an argon atmosphere, followed by subsequent annealing steps at 300 °C under various atmospheres, namely air (CuO:air), nitrogen (CuO:N) and oxygen (CuO:O). The resultant films have been studied to understand the influence of various annealing atmospheres on the structural, spectroscopic and thermoelectric properties. X-ray diffraction (XRD) patterns of the films showed reflexes that could be assigned to those of crystalline CuO with a thin mixed Cu (I) Cu (II) oxide, which was also observed by near edge X-ray absorption fine structure spectroscopy (NEXAFS). The positive Seebeck coefficient ( S ) reached values of up to 204 μV K −1, confirming the p-type behavior of the films. Annealing under oxygen provided a significant improvement in the electrical conductivity up to 50 S m −1, resulting in a power factor of 2 μW m −1 K −2 . The results reveal the interplay between the intrinsic composition and the thermoelectric performance of mixed copper oxide thin films, which can be finely adjusted by simply varying the annealing atmosphere. … (more)
- Is Part Of:
- RSC advances. Volume 10:Issue 49(2020)
- Journal:
- RSC advances
- Issue:
- Volume 10:Issue 49(2020)
- Issue Display:
- Volume 10, Issue 49 (2020)
- Year:
- 2020
- Volume:
- 10
- Issue:
- 49
- Issue Sort Value:
- 2020-0010-0049-0000
- Page Start:
- 29394
- Page End:
- 29401
- Publication Date:
- 2020-08-12
- Subjects:
- Chemistry -- Periodicals
540.5 - Journal URLs:
- http://pubs.rsc.org/en/Journals/JournalIssues/RA ↗
http://www.rsc.org/ ↗ - DOI:
- 10.1039/d0ra03906c ↗
- Languages:
- English
- ISSNs:
- 2046-2069
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 8036.750300
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 13829.xml