Structural and electronic-structure investigations of defects in Cu-ion-implanted SnO2 thin films. (September 2020)
- Record Type:
- Journal Article
- Title:
- Structural and electronic-structure investigations of defects in Cu-ion-implanted SnO2 thin films. (September 2020)
- Main Title:
- Structural and electronic-structure investigations of defects in Cu-ion-implanted SnO2 thin films
- Authors:
- Chaudhary, Surekha
Saraswat, Himani
Devi, Devarani
Kulriya, Pawan
Singh, Fouran
Won, Sung-Ok
Shin, Hyun-Joon
Parkash, Jai
Sharma, Aditya - Abstract:
- Abstract: SnO2 thin films have been deposited on Si substrates using RF-magnetron sputtering and implanted by 200 keV Cu − ions with ion fluence of 2.79 × 10 16 ion/cm 2 and 4 × 10 16 ion/cm 2 . Post annealing is done on the pristine and Cu − ion-implanted SnO2 thin films. Samples were characterized using the grazing-incidence X-ray diffraction (GIXRD), field-emission scanning electron microscopy (FESEM) and near-edge X-ray absorption fine structure (NEXAFS). After the annealing, amorphous to crystalline phase transition and growth of particles are seen. It is also evidenced that Cu ions do not make metallic/oxide phases up to the implantation dose of 2.79 × 10 16 ion/cm 2 . Cu L-edge NEXAFS has confirmed the Cu 2+ ions in the samples. The O K-edge NEXAFS spectra of annealed films have shown diminished peak intensity of O 2p to Sn 5s hybridized orbitals which signify the O vacancy formation. A pre-edge peak in the O K-edge NEXAFS of Cu implanted films has evolved and confirms the additional hybridization of unoccupied Cu d orbitals with O 2p orbitals. The improved intensity of Sn M5, 4 -edge features is due to the enhanced crystallinity in annealed samples. Ion-solid interaction induced structural and electronic structure amendments are briefly discussed in the light of energy-loss mechanism. Highlights: SnO2 films were deposited on Si substrates using RF-sputtering technique. Ion implantation was done using Cu ions with ion fluence 2.79 × 10 16 ion/cm 2 and 4 × 10 16 ion/cmAbstract: SnO2 thin films have been deposited on Si substrates using RF-magnetron sputtering and implanted by 200 keV Cu − ions with ion fluence of 2.79 × 10 16 ion/cm 2 and 4 × 10 16 ion/cm 2 . Post annealing is done on the pristine and Cu − ion-implanted SnO2 thin films. Samples were characterized using the grazing-incidence X-ray diffraction (GIXRD), field-emission scanning electron microscopy (FESEM) and near-edge X-ray absorption fine structure (NEXAFS). After the annealing, amorphous to crystalline phase transition and growth of particles are seen. It is also evidenced that Cu ions do not make metallic/oxide phases up to the implantation dose of 2.79 × 10 16 ion/cm 2 . Cu L-edge NEXAFS has confirmed the Cu 2+ ions in the samples. The O K-edge NEXAFS spectra of annealed films have shown diminished peak intensity of O 2p to Sn 5s hybridized orbitals which signify the O vacancy formation. A pre-edge peak in the O K-edge NEXAFS of Cu implanted films has evolved and confirms the additional hybridization of unoccupied Cu d orbitals with O 2p orbitals. The improved intensity of Sn M5, 4 -edge features is due to the enhanced crystallinity in annealed samples. Ion-solid interaction induced structural and electronic structure amendments are briefly discussed in the light of energy-loss mechanism. Highlights: SnO2 films were deposited on Si substrates using RF-sputtering technique. Ion implantation was done using Cu ions with ion fluence 2.79 × 10 16 ion/cm 2 and 4 × 10 16 ion/cm 2 . Amorphous to crystalline phase change, grain growth and release of strain is studied by GIXRD. O vacancy formation is confirmed by O K-edge NEXAFS. Additional hybridization of unoccupied Cu d orbitals with O 2p orbitals is also studied. … (more)
- Is Part Of:
- Vacuum. Volume 179(2020)
- Journal:
- Vacuum
- Issue:
- Volume 179(2020)
- Issue Display:
- Volume 179, Issue 2020 (2020)
- Year:
- 2020
- Volume:
- 179
- Issue:
- 2020
- Issue Sort Value:
- 2020-0179-2020-0000
- Page Start:
- Page End:
- Publication Date:
- 2020-09
- Subjects:
- Thin films -- XRD -- NEXAFS -- SnO2
Vacuum -- Periodicals
621.55 - Journal URLs:
- http://www.elsevier.com/journals ↗
http://www.sciencedirect.com/science/journal/0042207X ↗ - DOI:
- 10.1016/j.vacuum.2020.109481 ↗
- Languages:
- English
- ISSNs:
- 0042-207X
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 9139.000000
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 13711.xml