Nanolithography and its current advancements. (2020)

• Record Type: Journal Article
• Authors: Sebastian, Elvin Mathew; Jain, Suyash Kumar; Purohit, Rajesh; Dhakad, S.K.; Rana, R.S.
• Is Part Of: Materials today. Volume 26:Part 2(2020)
• Page Start: 2351
• Page End: 2356
• Publication Date: 2020
• Subjects: Nanolithography -- Photolithography -- Ion beam lithography -- X-ray lithography -- Electron beam lithography -- Photoresist -- Substrate; Materials science -- Congresses -- Periodicals; 620.1
• DOI: 10.1016/j.matpr.2020.02.505
• Languages: English
• ISSNs: 2214-7853

Abstract

Abstract: The current review article deals with Lithography and its techniques along with the recent developments in the field. Nano lithography, an emerging branch of Nanotechnology has created path breaking discoveries and developments till date. Nanolithography is basically the production or fabrication of structures or patterns in nano-meter scale. The field is currently on a huge demand and is considered essential for almost all the research and progress in science. There are three main lithographic techniques presently in use. The review covers the main and important steps for each technique useful to the user and also includes the advantages, disadvantages and applications of each technique. The recent discoveries and findings using photo-resists, substrates and photo masks etc. are also mentioned for each technique.