Iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater through forward osmosis. (10th June 2020)

• Record Type: Journal Article
• Authors: Chang, Hau-Ming; Chen, Shiao-Shing; Cai, Zhi-Sheng; Chang, Wen-Shing; Ray, Saikat Sinha; Nguyen, Nguyen Cong; Li, Chi-Wang; Paswan, Mithilesh
• Is Part Of: Journal of cleaner production. Volume 258(2020)
• Publication Date: 2020-06-10
• Subjects: Forward osmosis -- Iodide -- Boron -- Cetyltrimethylammonium bromide -- Membrane distillation; Factory and trade waste -- Management -- Periodicals; Manufactures -- Environmental aspects -- Periodicals; Déchets industriels -- Gestion -- Périodiques; Usines -- Aspect de l'environnement -- Périodiques; 628.5
• DOI: 10.1016/j.jclepro.2020.120587
• Languages: English
• ISSNs: 0959-6526

Abstract

Abstract: For the first time, simultaneous iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater were achieved using forward osmosis because iodide is a precious material and boron is toxic with 1 mg/L discharge standard in Taiwan. Cellulose triacetate and thin-film composite with aquaporin flat sheet membranes were tested for different feed solution, pH levels, and draw solution concentrations. The results indicated that the thin-film composite membrane had high boron and iodide rejections (98.4% and 98.3%, respectively) at a pH of 11; however, with a feed boron concentration of 600 mg/L, 9.8 mg/L boron was still present in the draw solution. Cationic surfactant cetyltrimethylammonium bromide was used to enhance the iodide recovery and boron removal efficiencies. Both efficiencies increased to 99.9% with 0.5 mM cetyltrimethylammonium bromide, and only 0.64 mg/L boron was present in the draw solution. In addition, negligible flux reduction was observed for forward osmosis process in the presence of cetyltrimethylammonium bromide. A membrane distillation system was used to concentrate and purify the MgCl2 draw solution. Thus, the hybrid forward osmosis-membrane distillation process can be applied for iodide recovery and boron removal in the thin-film transistor liquid crystal display industry. Highlights: Iodide recovery and boron removal were achieved from the TFT-LCD wastewater. Surfactant CTAB was used to enhance the iodide recovery and boron removal. The removals were increased to 99.9% with 0.64 mg/L boron in the DS by 0.5 mM CTAB. FO-MD can be used for iodide recovery and boron removal in the TFT-LCD industry.