Cyclic Silylselenides: Convenient Selenium Precursors for Atomic Layer Deposition. Issue 3 (23rd March 2020)

• Record Type: Journal Article
• Authors: Charvot, Jaroslav; Pokorný, Daniel; Zazpe, Raul; Krumpolec, Richard; Pavliňák, David; Hromádko, Luděk; Přikryl, Jan; Rodriguez‐Pereira, Jhonatan; Klikar, Milan; Jelínková, Veronika; Macak, Jan M.; Bureš, Filip
• Is Part Of: ChemPlusChem. Volume 85:Issue 3(2020)
• Page Start: 576
• Page End: 579
• Publication Date: 2020-03-23
• Subjects: atomic layer deposition -- molybdenum -- nanostructures -- selenium -- transition metal dichalcogenides; Chemistry -- Periodicals; 540.5
• DOI: 10.1002/cplu.202000108
• Languages: English
• ISSNs: 2192-6506

Abstract

Abstract: Three cyclic silylselenides were prepared in a straightforward manner. Property tuning has been achieved by varying the ring size and the number of embedded selenium atoms. All silylselenides possess improved resistance towards moisture and oxidation as well as high thermal robustness and sufficient volatility with almost zero residues. The six‐membered diselenide proved to be particularly superior Se precursors for atomic layer deposition and allowed facile preparation of MoSe2 layers. Their structure and composition have been investigated by Raman and X‐ray photoelectron spectroscopy as well as scanning electron microscopy revealing vertically aligned flaky shaped nanosheets. Abstract : Made to order : A volatile, sufficiently reactive, and easy‐to‐synthesize solid Se precursor based on a cyclic sylilselenide has been developed. It possesses a good balance between chemical and thermal stability, and reactivity towards MoCl5 . It has further been used for depositing MoSe2 nanosheets, the structure of which has been confirmed by various techniques.