Inside Cover Picture: Plasma Process. Polym. 5/2020. Issue 5 (4th May 2020)

• Record Type: Journal Article
• Authors: Dasgupta, Malini; Fortugno, Paolo; Wiggers, Hartmut
• Other Names: Choukourov Andrei guestEditor.; Mangolini Lorenzo guestEditor.
• Is Part Of: Plasma processes and polymers. Volume 17:Issue 5(2020)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2020-05-04
• Subjects: Plasma polymerization -- Periodicals; Plasma-enhanced chemical vapor deposition -- Periodicals; Plasma chemistry -- Periodicals
• DOI: 10.1002/ppap.202070012
• Languages: English
• ISSNs: 1612-8850

Abstract

Abstract : Inside Front Cover : Silicon nanoparticles produced in a microwave‐assisted plasma reactor are subjected to in‐line functionalization in the plasma after‐glow. Various coating precursors including TEOS, HMDSO and OMCTS were tested for their suitability. TEOS emerged to be the optimum choice in terms of formation of thin layers of pure SiO2 around the silicon core. The photograph shows the plasma zone with the beam of luminescing silicon nanoparticles. The image is taken by Jan Menser. Further details can be found in the article by Malini Dasgupta, Paolo Fortugno, Hartmut Wiggers. (e1900245 ).