Wet Etching: Controlling the Facet of ZnO during Wet Chemical Etching Its (0001¯) O‐Terminated Surface (Small 14/2020). Issue 14 (14th April 2020)

• Record Type: Journal Article
• Authors: Sun, Mei; Yu, Bocheng; Hong, Mengyu; Li, Zhiwei; Lyu, Fengjiao; Li, Xing; Li, Zhihong; Wei, Xianlong; Zhang, Zheng; Zhang, Yue; Chen, Qing
• Is Part Of: Small. Volume 16:Issue 14(2020)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2020-04-14
• Subjects: facet control -- high‐index crystal facets -- in situ liquid cell TEM -- micromasking -- O2 plasma treatment -- wet chemical etching -- ZnO nano/micro belts; Nanotechnology -- Periodicals; Nanoparticles -- Periodicals; Microtechnology -- Periodicals; 620.5
• DOI: 10.1002/smll.202070076
• Languages: English
• ISSNs: 1613-6810

Abstract

Abstract : In article number 1906435, Qing Chen and co‐workers obtain high‐index {01 1 ¯ 3 ¯ } facets of ZnO during wet chemical etching of the (000 1 ¯ ) O‐terminated surface of ZnO and also provide the direct experimental evidence of the micromasking mechanism for the hillocks formation via an in situ liquid cell transmission electron microscopy study.