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HARVARD Citation
Blasco, R. et al. (2020). Low‐to‐Mid Al Content (x = 0–0.56) AlxIn1−xN Layers Deposited on Si(100) by Radio‐Frequency Sputtering. Physica status solidi. 257 (4), p. n/a. [Online].
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Blasco, R. et al. (2020). Low‐to‐Mid Al Content (x = 0–0.56) AlxIn1−xN Layers Deposited on Si(100) by Radio‐Frequency Sputtering. Physica status solidi. 257 (4), p. n/a. [Online].