Electrical Contact Formation in Micro Four‐Point Probe Measurements. Issue 5 (12th November 2019)

• Record Type: Journal Article
• Authors: Folkersma, Steven; Bogdanowicz, Janusz; Petersen, Dirch H.; Hansen, Ole; Henrichsen, Henrik H.; Nielsen, Peter F.; Shiv, Lior; Vandervorst, Wilfried
• Is Part Of: Physica status solidi. Volume 217:Issue 5(2020)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2019-11-12
• Subjects: electrical contacts -- fin field-effect transistors -- mirco four-point probes; Solid state physics -- Periodicals; Solids -- Industrial applications -- Periodicals; 530.41
• DOI: 10.1002/pssa.201900579
• Languages: English
• ISSNs: 1862-6300

Abstract

Abstract : Herein, the electrical contact formation between the electrodes of the micro four‐point technique and a semiconducting sample is described. It is shown that the contact is formed in two stages: a voltage‐induced electrical contact formation, followed by a current‐induced decrease in contact resistance. Moreover, a method is proposed allowing for precise control of the final contact resistance. Finally, it is demonstrated that the contacting process is similar on 1D fin structures, where the demonstrated control of the electrical contact is needed while measuring on nanometer‐wide fins in arrays with a pitch smaller than the electrode contact size. Abstract : This article presents a detailed study on the electrical contact formation between the electrodes of the micro four‐point technique and a semiconducting sample. In addition, an electrical contact formation method that allows for precise control of the final contact resistance is proposed, which is essential while trying to measure on nanometer‐wide fins dense arrays.