Trimethylchlorosilane, (CH3)3SiCl: OH reaction kinetics and infrared spectrum. Issue 4 (21st January 2020)

• Record Type: Journal Article
• Authors: Papanastasiou, Dimitrios K.; Bernard, François; Burkholder, James B.
• Is Part Of: International journal of chemical kinetics. Volume 52:Issue 4(2020)
• Page Start: 221
• Page End: 226
• Publication Date: 2020-01-21
• Subjects: gas‐phase -- OH radical -- pulsed laser photolysis laser‐induced fluorescence -- temperature dependence -- trimethylchlorosilane; Chemical kinetics -- Periodicals; 541.394
• DOI: 10.1002/kin.21344
• Languages: English
• ISSNs: 0538-8066

Abstract

Abstract: Rate coefficients for the OH + (CH3 )3 SiCl (trimethylchlorosilane) gas‐phase reaction were measured over the temperature range 295–375 K using a pulsed laser photolysis laser‐induced fluorescence technique. The room temperature rate coefficient was determined to be k 1 (295 K) = (2.51 ± 0.13) × 10 −13 cm 3 molecule –1 s –1 . The Arrhenius expression k 1 ( T ) = (7.06 ± 2.15) × 10 −12 exp[–(992 ± 101)/ T ] cm 3 molecule –1 s –1, where the quoted uncertainties are 2σ fit precision, describes the measured temperature dependence very well. As part of this work, the infrared spectra of CH3 )3 SiCl was measured.