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HARVARD Citation
Väyrynen, K. et al. (2019). Atomic Layer Deposition of Nickel Nitride Thin Films using NiCl2(TMPDA) and Tert‐Butylhydrazine as Precursors. Physica status solidi. 216 (11), p. n/a. [Online].
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Väyrynen, K. et al. (2019). Atomic Layer Deposition of Nickel Nitride Thin Films using NiCl2(TMPDA) and Tert‐Butylhydrazine as Precursors. Physica status solidi. 216 (11), p. n/a. [Online].