Effects of precursor pre-treatment on the vapor deposition of WS2 monolayers. Issue 3 (5th December 2018)
- Record Type:
- Journal Article
- Title:
- Effects of precursor pre-treatment on the vapor deposition of WS2 monolayers. Issue 3 (5th December 2018)
- Main Title:
- Effects of precursor pre-treatment on the vapor deposition of WS2 monolayers
- Authors:
- Pam, Mei Er
Shi, Yumeng
Hu, Junping
Zhao, Xiaoxu
Dan, Jiadong
Gong, Xue
Huang, Shaozhuan
Geng, Dechao
Pennycook, Stephen
Ang, Lay Kee
Yang, Hui Ying - Abstract:
- Abstract : Transition metal oxide powders have been widely used as the growth precursors for monolayer transition metal dichalcogenides (TMDCs) in chemical vapor deposition (CVD). Abstract : Transition metal oxide powders have been widely used as the growth precursors for monolayer transition metal dichalcogenides (TMDCs) in chemical vapor deposition (CVD). It has been proposed that metal oxide precursors in the gas phase undergo a two-step reaction during CVD growth, where transition metal sub-oxides are likely formed first and then the sulfurization of these sub-oxides leads to the formation of TMDCs. However, the effects of stoichiometry of transition metal oxide precursors on the growth of TMDC monolayers have not been studied yet. In this contribution, we report the critical role of the WO3 precursor pre-annealing process on the growth of WS2 monolayers. Besides, several WO3 precursors with different types of oxygen vacancies have also been prepared and investigated by X-ray powder diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and density functional theory calculation. Among all the non-stoichiometric WO3 precursors, thermally annealed WO3 powder exhibits the highest oxygen vacancy concentration and produces WS2 monolayers with significantly improved quality in terms of lateral size, density, and crystallinity. Our comprehensive study suggests that the chemical composition of transition metal oxide precursors would be fundamentally critical for the growth ofAbstract : Transition metal oxide powders have been widely used as the growth precursors for monolayer transition metal dichalcogenides (TMDCs) in chemical vapor deposition (CVD). Abstract : Transition metal oxide powders have been widely used as the growth precursors for monolayer transition metal dichalcogenides (TMDCs) in chemical vapor deposition (CVD). It has been proposed that metal oxide precursors in the gas phase undergo a two-step reaction during CVD growth, where transition metal sub-oxides are likely formed first and then the sulfurization of these sub-oxides leads to the formation of TMDCs. However, the effects of stoichiometry of transition metal oxide precursors on the growth of TMDC monolayers have not been studied yet. In this contribution, we report the critical role of the WO3 precursor pre-annealing process on the growth of WS2 monolayers. Besides, several WO3 precursors with different types of oxygen vacancies have also been prepared and investigated by X-ray powder diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and density functional theory calculation. Among all the non-stoichiometric WO3 precursors, thermally annealed WO3 powder exhibits the highest oxygen vacancy concentration and produces WS2 monolayers with significantly improved quality in terms of lateral size, density, and crystallinity. Our comprehensive study suggests that the chemical composition of transition metal oxide precursors would be fundamentally critical for the growth of large-area and high-quality WS2 monolayers, which further pave the way for revealing their intrinsic properties and unique applications. … (more)
- Is Part Of:
- Nanoscale advances. Volume 1:Issue 3(2019)
- Journal:
- Nanoscale advances
- Issue:
- Volume 1:Issue 3(2019)
- Issue Display:
- Volume 1, Issue 3 (2019)
- Year:
- 2019
- Volume:
- 1
- Issue:
- 3
- Issue Sort Value:
- 2019-0001-0003-0000
- Page Start:
- 953
- Page End:
- 960
- Publication Date:
- 2018-12-05
- Subjects:
- 620.5
- Journal URLs:
- http://pubs.rsc.org/en/journals/journalissues/na#!recentarticles&adv ↗
http://www.rsc.org/ ↗ - DOI:
- 10.1039/c8na00212f ↗
- Languages:
- English
- ISSNs:
- 2516-0230
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 12827.xml