Cite
HARVARD Citation
Mai, L. et al. (2019). Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide. Chemistry. 25 (31), pp. 7489-7500. [Online].
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Mai, L. et al. (2019). Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide. Chemistry. 25 (31), pp. 7489-7500. [Online].