Real‐ and Q‐space travelling: multi‐dimensional distribution maps of crystal‐lattice strain (ϵ044) and tilt of suspended monolithic silicon nanowire structures. Issue 1 (18th December 2019)
- Record Type:
- Journal Article
- Title:
- Real‐ and Q‐space travelling: multi‐dimensional distribution maps of crystal‐lattice strain (ϵ044) and tilt of suspended monolithic silicon nanowire structures. Issue 1 (18th December 2019)
- Main Title:
- Real‐ and Q‐space travelling: multi‐dimensional distribution maps of crystal‐lattice strain (ϵ044) and tilt of suspended monolithic silicon nanowire structures
- Authors:
- Dolabella, Simone
Frison, Ruggero
Chahine, Gilbert A.
Richter, Carsten
Schulli, Tobias U.
Tasdemir, Zuhal
Alaca, B. Erdem
Leblebici, Yusuf
Dommann, Alex
Neels, Antonia - Abstract:
- Abstract : A multiscale analytical approach is presented for understanding the structure of micro‐ and nano‐fabricated nanowire‐based sensors. Using scanning X‐ray diffraction microscopy, crystal deformation is evaluated with respect to lattice strain and tilt caused by the manufacturing process of a silicon monolith. Abstract : Silicon nanowire‐based sensors find many applications in micro‐ and nano‐electromechanical systems, thanks to their unique characteristics of flexibility and strength that emerge at the nanoscale. This work is the first study of this class of micro‐ and nano‐fabricated silicon‐based structures adopting the scanning X‐ray diffraction microscopy technique for mapping the in‐plane crystalline strain (ϵ044 ) and tilt of a device which includes pillars with suspended nanowires on a substrate. It is shown how the micro‐ and nanostructures of this new type of nanowire system are influenced by critical steps of the fabrication process, such as electron‐beam lithography and deep reactive ion etching. X‐ray analysis performed on the 044 reflection shows a very low level of lattice strain (<0.00025 Δ d / d ) but a significant degree of lattice tilt (up to 0.214°). This work imparts new insights into the crystal structure of micro‐ and nanomaterial‐based sensors, and their relationship with critical steps of the fabrication process.
- Is Part Of:
- Journal of applied crystallography. Volume 53:Issue 1(2020)
- Journal:
- Journal of applied crystallography
- Issue:
- Volume 53:Issue 1(2020)
- Issue Display:
- Volume 53, Issue 1 (2020)
- Year:
- 2020
- Volume:
- 53
- Issue:
- 1
- Issue Sort Value:
- 2020-0053-0001-0000
- Page Start:
- 58
- Page End:
- 68
- Publication Date:
- 2019-12-18
- Subjects:
- nano‐electromechanical systems -- NEMS -- micro‐electromechanical systems -- MEMS -- nanowires -- scanning X‐ray diffraction microscopy -- lattice tilt and strain mapping
Crystallography -- Periodicals
548.05 - Journal URLs:
- http://firstsearch.oclc.org ↗
http://journals.iucr.org/j/journalhomepage.html ↗
http://www-us.ebsco.com/online/direct.asp?JournalID=105188 ↗
http://www.blackwell-synergy.com/loi/jcr ↗
http://www.blackwell-synergy.com/servlet/useragent?func=showIssues&code=jcr&open=2004#C2004 ↗
http://onlinelibrary.wiley.com/journal/10.1107/S16005767 ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1107/S1600576719015504 ↗
- Languages:
- English
- ISSNs:
- 0021-8898
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 4942.400000
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