Cite
HARVARD Citation
Park, S. et al. (2019). Comparative study on atomic layer deposition of HfO2via substitution of ligand structure with cyclopentadiene. Journal of materials chemistry. 8 (4), pp. 1344-1352. [Online].
This is an interim version of our Electronic Legal Deposit Catalogue-eJournals and eBooks while we continue to recover from a cyber-attack.
Park, S. et al. (2019). Comparative study on atomic layer deposition of HfO2via substitution of ligand structure with cyclopentadiene. Journal of materials chemistry. 8 (4), pp. 1344-1352. [Online].