Facile Au-assisted epitaxy of nearly strain-free GaN films on sapphire substrates. Issue 4 (10th January 2020)

• Record Type: Journal Article
• Authors: Li, Pengkun; Xiong, Tinghui; Wang, Lilin; Sun, Shujing; Chen, Chenlong
• Is Part Of: RSC advances. Volume 10:Issue 4(2020)
• Page Start: 2096
• Page End: 2103
• Publication Date: 2020-01-10
• Subjects: Chemistry -- Periodicals; 540.5
• DOI: 10.1039/c9ra09689b
• Languages: English
• ISSNs: 2046-2069

Abstract

Abstract : The nearly strain-free GaN films are epitaxially grown on Au-coated c -plane sapphire substrates via a self-patterned process. Abstract : The nearly strain-free GaN films were epitaxially grown successfully on the Au-coated c -plane sapphire substrate by a convenient chemical vapor deposition approach. The growth of GaN single crystalline epitaxial films is a self-patterned process. The morphology, structure, compositions and optical properties of as-synthesized GaN materials were characterized through field-emission scanning electron microscopy, atomic force microscopy, X-ray diffraction, X-ray photoelectron spectroscopy, energy dispersive spectroscopy mapping, Raman spectroscopy and photoluminescence spectroscopy. The characterization results confirm that the epitaxial GaN films grown on Au-coated c -plane sapphire substrates have a single-crystalline and nearly strain-free structure, and exhibit strong UV emission. A possible growth mechanism of the GaN film is proposed: Au-assisted vapor deposition initiates the nucleation of the GaN seeds, and then these seeds grow into inclined inverted hexagonal GaN pyramids with a threefold azimuthal symmetry and vertical inverted hexagonal pyramids; and subsequently, the vertical inverted hexagonal pyramids expand laterally and annihilate the inclined inverted hexagonal pyramids; eventually these vertical pyramids coalesced to form nearly strain-free GaN films. This synthesis strategy provides a new idea for the simple self-patterned growth of nearly strain-free GaN epitaxial films on Au-coated sapphire substrates, and will promote broader applications in GaN-based electronic and optoelectronic devices.