Thermal poling induced second-order optical nonlinearity in phosphosilicate glass thin films. Issue 21 (15th December 2019)

• Record Type: Journal Article
• Authors: Chen, Huai-Yi; Lin, Hong-Yuan
• Is Part Of: Journal of modern optics. Volume 66:Issue 21(2019)
• Page Start: 2053
• Page End: 2062
• Publication Date: 2019-12-15
• Subjects: Thermal poling -- phosphosilicate glass (PSG) -- thin films -- fused silica -- nonlinear optics -- second-harmonic generation (SHG); Optics -- Periodicals; 535
• DOI: 10.1080/09500340.2019.1691276
• Languages: English
• ISSNs: 0950-0340

Abstract

ABSTRACT: A phosphosilicate glass (PSG) nonlinear film is prepared on a fused silica plate using plasma- enhanced chemical vapour deposition (PECVD) and thermal poling. Under all poling conditions, the second-harmonic generation (SHG) signals of the PSG thin-film samples are stronger than those of pristine fused silica. The poling mechanism can be well explained qualitatively by the electric-field induced second-harmonic generation (EFISH) and dipole reorientation models. The hindering effect of the film-glass interface is also observed. Besides, the threshold poling temperature ( To ), poling voltage ( Vo ) and poling duration ( to ) of the PSG thin-film samples are all smaller than those of pristine fused silica, which may be ascribed to less dense PSG films. The nonlinear profile of the PSG thin-film sample is distributed in the whole film and the partial glass substrate on the anodic side of the sample. The second-order nonlinear susceptibility ( χ (2) ) is around 0.58 and 0.32 pm/V, respectively.