Dielectric ceramics/TiO2/single-crystalline silicon nanomembrane heterostructure for high performance flexible thin-film transistors on plastic substrates. Issue 60 (31st October 2019)
- Record Type:
- Journal Article
- Title:
- Dielectric ceramics/TiO2/single-crystalline silicon nanomembrane heterostructure for high performance flexible thin-film transistors on plastic substrates. Issue 60 (31st October 2019)
- Main Title:
- Dielectric ceramics/TiO2/single-crystalline silicon nanomembrane heterostructure for high performance flexible thin-film transistors on plastic substrates
- Authors:
- Qin, Guoxuan
Pei, Zhihui
Zhang, Yibo
Lan, Kuibo
Li, Quanning
Li, Lingxia
Yu, Shihui
Chen, Xuejiao - Abstract:
- Abstract : Dielectric ceramics/TiO2/single-crystalline silicon nanomembrane heterostructure for high performance flexible thin-film transistors. Abstract : A dielectric ceramics/TiO2 /single-crystalline silicon nanomembrane (SiNM) heterostructure is designed and fabricated for high performance flexible thin-film transistors (TFTs). Both the dielectric ceramics (Nb2 O3 –Bi2 O3 –MgO) and TiO2 are deposited by radio frequency (RF) magnetron sputtering at room temperature, which is compatible with flexible plastic substrates. And the single-crystalline SiNM is transferred and attached to the dielectric ceramics/TiO2 layers to form the heterostructure. The experimental results demonstrate that the room temperature processed heterostructure has high quality because: (1) the Nb2 O3 –Bi2 O3 –MgO/TiO2 heterostructure has a high dielectric constant (∼76.6) and low leakage current. (2) The TiO2 /single-crystalline SiNM structure has a relatively low interface trap density. (3) The band gap of the Nb2 O3 –Bi2 O3 –MgO/TiO2 heterostructure is wider than TiO2, which increases the conduction band offset between Si and TiO2, lowering the leakage current. Flexible TFTs have been fabricated with the Nb2 O3 –Bi2 O3 –MgO/TiO2 /SiNM heterostructure on plastic substrates and show a current on/off ratio over 10 4, threshold voltage of ∼1.2 V, subthreshold swing ( SS ) as low as ∼0.2 V dec −1, and interface trap density of ∼10 12 eV −1 cm −2 . The results indicate that the dielectric ceramics/TiO2Abstract : Dielectric ceramics/TiO2/single-crystalline silicon nanomembrane heterostructure for high performance flexible thin-film transistors. Abstract : A dielectric ceramics/TiO2 /single-crystalline silicon nanomembrane (SiNM) heterostructure is designed and fabricated for high performance flexible thin-film transistors (TFTs). Both the dielectric ceramics (Nb2 O3 –Bi2 O3 –MgO) and TiO2 are deposited by radio frequency (RF) magnetron sputtering at room temperature, which is compatible with flexible plastic substrates. And the single-crystalline SiNM is transferred and attached to the dielectric ceramics/TiO2 layers to form the heterostructure. The experimental results demonstrate that the room temperature processed heterostructure has high quality because: (1) the Nb2 O3 –Bi2 O3 –MgO/TiO2 heterostructure has a high dielectric constant (∼76.6) and low leakage current. (2) The TiO2 /single-crystalline SiNM structure has a relatively low interface trap density. (3) The band gap of the Nb2 O3 –Bi2 O3 –MgO/TiO2 heterostructure is wider than TiO2, which increases the conduction band offset between Si and TiO2, lowering the leakage current. Flexible TFTs have been fabricated with the Nb2 O3 –Bi2 O3 –MgO/TiO2 /SiNM heterostructure on plastic substrates and show a current on/off ratio over 10 4, threshold voltage of ∼1.2 V, subthreshold swing ( SS ) as low as ∼0.2 V dec −1, and interface trap density of ∼10 12 eV −1 cm −2 . The results indicate that the dielectric ceramics/TiO2 /SiNM heterostructure has great potential for high performance TFTs. … (more)
- Is Part Of:
- RSC advances. Volume 9:Issue 60(2019)
- Journal:
- RSC advances
- Issue:
- Volume 9:Issue 60(2019)
- Issue Display:
- Volume 9, Issue 60 (2019)
- Year:
- 2019
- Volume:
- 9
- Issue:
- 60
- Issue Sort Value:
- 2019-0009-0060-0000
- Page Start:
- 35289
- Page End:
- 35296
- Publication Date:
- 2019-10-31
- Subjects:
- Chemistry -- Periodicals
540.5 - Journal URLs:
- http://pubs.rsc.org/en/Journals/JournalIssues/RA ↗
http://www.rsc.org/ ↗ - DOI:
- 10.1039/c9ra06572e ↗
- Languages:
- English
- ISSNs:
- 2046-2069
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 8036.750300
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 12103.xml