Cite
HARVARD Citation
Farrell, P. et al. (2019). Nonlinear diffusion, boundary layers and nonsmoothness: Analysis of challenges in drift–diffusion semiconductor simulations. Computers & mathematics with applications. pp. 3731-3747. [Online].
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Farrell, P. et al. (2019). Nonlinear diffusion, boundary layers and nonsmoothness: Analysis of challenges in drift–diffusion semiconductor simulations. Computers & mathematics with applications. pp. 3731-3747. [Online].