Secondary electron emissive thin film fabricated by atomic layer deposition. (October 2019)

• Record Type: Journal Article
• Authors: Lin, Yanjian; Gu, Yunting; Yan, Baojun; Liu, Shulin; Wen, Kaile; Wang, Yuman; Heng, Yuekun
• Is Part Of: IOP conference series. Volume 612:issue 3(2019)
• Publication Date: 2019-10
• Subjects: Materials science -- Periodicals; 620.1105
• DOI: 10.1088/1757-899X/612/3/032103
• Languages: English
• ISSNs: 1757-8981

Abstract

Abstract: The secondary electron emissive alumina thin film was fabricated by atomic layer deposition (ALD). The film thickness, structure and composition were characterized by Spectroscopic Ellipsometry (SE), X-ray Diffraction (XRD) and X-ray photoelectron spectroscopy (XPS), respectively. The secondary electron yield ( σ ) of the sample was measured by pulsed electron beam method and the influences of primary electron energy and primary electron angle on the σ have been investigated.