Effect of argon-nitrogen mixed ambient Ni sputtering on the interface diffusion of Ni/Ti periodic multilayers and supermirrors. (November 2019)
- Record Type:
- Journal Article
- Title:
- Effect of argon-nitrogen mixed ambient Ni sputtering on the interface diffusion of Ni/Ti periodic multilayers and supermirrors. (November 2019)
- Main Title:
- Effect of argon-nitrogen mixed ambient Ni sputtering on the interface diffusion of Ni/Ti periodic multilayers and supermirrors
- Authors:
- Abharana, N.
Biswas, A.
Sarkar, P.
Rai, S.
Singh, S.
Kumar, S.
Jha, S.N.
Bhattacharyya, D. - Abstract:
- Abstract: Interface roughness and interface diffusion are two very crucial parameters in determining the performances of thin film multilayer devices for applications in X-ray optics, neutron optics, giant magneto resistance devices etc. Preparation of these thin film multilayers with sharp interfaces is a technological challenge and researchers are using different methods to reduce the interface imperfections. It has been observed that by mixing nitrogen with argon in sputtering ambience during deposition of Ni layers, neutron reflectivity of Ni/Ti neutron supermirrors can be improved significantly.To elucidate the physical mechanism behind this observation, two sets of Ni/Ti periodic multilayers have been prepared using an indigenously built in-line magnetron sputtering system, in one set pure Ar has been used in sputtering ambience and in the other set a mixed ambience of Ar + N2 has been used for deposition of Ni layers. Both the sets of multilayers have been thoroughly characterized by specular and diffused Grazing Incidence X-ray Reflectivity, Nuclear Resonance Reaction, X-ray diffraction and Grazing Incidence Extended X-ray Absorption Fine Structure measurements using synchrotron radiation. All the above complementary measurements unambiguously establish that the reason for improved performance of the supermirror deposited with Ar + N2 ambience is the reduction of interface diffusion at Ti-on-Ni interfaces. Highlights: Ni/Ti multilayers and supermirrors deposited byAbstract: Interface roughness and interface diffusion are two very crucial parameters in determining the performances of thin film multilayer devices for applications in X-ray optics, neutron optics, giant magneto resistance devices etc. Preparation of these thin film multilayers with sharp interfaces is a technological challenge and researchers are using different methods to reduce the interface imperfections. It has been observed that by mixing nitrogen with argon in sputtering ambience during deposition of Ni layers, neutron reflectivity of Ni/Ti neutron supermirrors can be improved significantly.To elucidate the physical mechanism behind this observation, two sets of Ni/Ti periodic multilayers have been prepared using an indigenously built in-line magnetron sputtering system, in one set pure Ar has been used in sputtering ambience and in the other set a mixed ambience of Ar + N2 has been used for deposition of Ni layers. Both the sets of multilayers have been thoroughly characterized by specular and diffused Grazing Incidence X-ray Reflectivity, Nuclear Resonance Reaction, X-ray diffraction and Grazing Incidence Extended X-ray Absorption Fine Structure measurements using synchrotron radiation. All the above complementary measurements unambiguously establish that the reason for improved performance of the supermirror deposited with Ar + N2 ambience is the reduction of interface diffusion at Ti-on-Ni interfaces. Highlights: Ni/Ti multilayers and supermirrors deposited by magnetron sputtering technique. Two sets deposited: (i) using pure Ar ambience and (ii) using Ar + N2 ambience for Ni deposition. Samples characterized by XRD, specular and diffused GIXR and Grazing Incidence EXAFS. All measurements suggest less inter-diffusion at Ti-on-Ni interfaces due to use of N2 . The effect is manifested in higher neutron reflectivity of supermirrors deposited under mixed ambience. … (more)
- Is Part Of:
- Vacuum. Volume 169(2019)
- Journal:
- Vacuum
- Issue:
- Volume 169(2019)
- Issue Display:
- Volume 169, Issue 2019 (2019)
- Year:
- 2019
- Volume:
- 169
- Issue:
- 2019
- Issue Sort Value:
- 2019-0169-2019-0000
- Page Start:
- Page End:
- Publication Date:
- 2019-11
- Subjects:
- Vacuum -- Periodicals
621.55 - Journal URLs:
- http://www.elsevier.com/journals ↗
http://www.sciencedirect.com/science/journal/0042207X ↗ - DOI:
- 10.1016/j.vacuum.2019.108864 ↗
- Languages:
- English
- ISSNs:
- 0042-207X
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 9139.000000
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 11896.xml