Cite
HARVARD Citation
Liu, H. et al. (2019). Performance enhancement of the dual-metal gate In0.53Ga0.47As dopingless TFET by using a platinum metal strip insertion. Japanese journal of applied physics. p. . [Online].
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Liu, H. et al. (2019). Performance enhancement of the dual-metal gate In0.53Ga0.47As dopingless TFET by using a platinum metal strip insertion. Japanese journal of applied physics. p. . [Online].