Basic properties mapping of anodic oxides in the hafnium–niobium–tantalum ternary system. Issue 1 (31st December 2018)
- Record Type:
- Journal Article
- Title:
- Basic properties mapping of anodic oxides in the hafnium–niobium–tantalum ternary system. Issue 1 (31st December 2018)
- Main Title:
- Basic properties mapping of anodic oxides in the hafnium–niobium–tantalum ternary system
- Authors:
- Mardare, Andrei Ionut
Mardare, Cezarina Cela
Kollender, Jan Philipp
Huber, Silvia
Hassel, Achim Walter - Abstract:
- ABSTRACT: A thin film combinatorial library deposited by co-sputtering of Hf, Nb and Ta was employed to characterise fundamental properties of the Hf-Nb-Ta system. Compositional mappings of microstructure and crystallography revealed similarities in alloy evolution. Distinct lattice distortion was observed upon addition of hexagonal Hf, leading to amorphisation of alloys containing more than 32 at.% Hf and less than 27 and 41 at.% Nb and Ta, respectively. Volta potential and open circuit potential mappings indicated minimal values for the highest Hf concentration. Localised anodisation of the library by scanning droplet cell microscopy revealed valve metal behaviour. Oxide formation factors above 2 nm V −1 were identified in compositional zones with high amounts of Nb and Ta. Fitting of electrochemical impedance spectroscopy data allowed electrical permittivity and resistivity of mixed oxides to be mapped. Their compositional behaviours were attributed to characteristics of the parent metal alloys and particularities of the pure oxides. Mott–Schottky analysis suggested n-type semiconductor properties for all Hf–Nb–Ta oxides studied. Donor density and flat-band potential were mapped compositionally, and their variations were found to be related mainly to the Nb amount. Synergetic effects were identified in mappings of Hf-Nb-Ta parent metals and their anodic oxides. Graphical Abstract:
- Is Part Of:
- Science and technology of advanced materials. Volume 19:Issue 1(2018)
- Journal:
- Science and technology of advanced materials
- Issue:
- Volume 19:Issue 1(2018)
- Issue Display:
- Volume 19, Issue 1 (2018)
- Year:
- 2018
- Volume:
- 19
- Issue:
- 1
- Issue Sort Value:
- 2018-0019-0001-0000
- Page Start:
- 554
- Page End:
- 568
- Publication Date:
- 2018-12-31
- Subjects:
- Combinatorial libraries -- high-throughput experimentation -- scanning droplet cell microscopy -- anodic oxide films -- valve metals
40 Optical, magnetic and electronic device materials -- 202 Dielectrics / Piezoelectrics / Insulators -- 306 Thin film / Coatings, Anodic oxides
Materials -- Technological innovations -- Periodicals
620.112 - Journal URLs:
- http://iopscience.iop.org/1468-6996 ↗
https://tandfonline.com/toc/tsta20/current ↗
http://ioppublishing.org/ ↗ - DOI:
- 10.1080/14686996.2018.1498703 ↗
- Languages:
- English
- ISSNs:
- 1468-6996
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 8134.254650
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 11768.xml