Molecular Beam Epitaxy and Electronic Structure of Atomically Thin Oxyselenide Films. Issue 39 (7th August 2019)
- Record Type:
- Journal Article
- Title:
- Molecular Beam Epitaxy and Electronic Structure of Atomically Thin Oxyselenide Films. Issue 39 (7th August 2019)
- Main Title:
- Molecular Beam Epitaxy and Electronic Structure of Atomically Thin Oxyselenide Films
- Authors:
- Liang, Yan
Chen, Yujie
Sun, Yuanwei
Xu, Shipu
Wu, Jinxiong
Tan, Congwei
Xu, Xiaofeng
Yuan, Hongtao
Yang, Lexian
Chen, Yulin
Gao, Peng
Guo, Jiandong
Peng, Hailin - Abstract:
- Abstract: Atomically thin oxychalcogenides have been attracting intensive attention for their fascinating fundamental properties and application prospects. Bi2 O2 Se, a representative of layered oxychalcogenides, has emerged as an air‐stable high‐mobility 2D semiconductor that holds great promise for next‐generation electronics. The preparation and device fabrication of high‐quality Bi2 O2 Se crystals down to a few atomic layers remains a great challenge at present. Here, molecular beam epitaxy (MBE) of atomically thin Bi2 O2 Se films down to monolayer on SrTiO3 (001) substrate is achieved by co‐evaporating Bi and Se precursors in oxygen atmosphere. The interfacial atomic arrangements of MBE‐grown Bi2 O2 Se/SrTiO3 are unambiguously revealed, showing an atomically sharp interface and atom‐to‐atom alignment. Importantly, the electronic band structures of one‐unit‐cell (1‐UC) thick Bi2 O2 Se films are observed by angle‐resolved photoemission spectroscopy (ARPES), showing low effective mass of ≈0.15 m 0 and bandgap of ≈0.8 eV. These results may be constructive to the synthesis of other 2D oxychalcogenides and investigation of novel physical properties. Abstract : Ultrathin Bi2 O2 Se films down to monolayer thickness are grown on a SrTiO3 (001) substrate via molecular beam epitaxy (MBE), and an atomically sharp interface between Bi2 O2 Se and SrTiO3 can be observed. Furthermore, the electronic band structures of one‐unit‐cell (1‐UC) Bi2 O2 Se films are observed, revealing a lowAbstract: Atomically thin oxychalcogenides have been attracting intensive attention for their fascinating fundamental properties and application prospects. Bi2 O2 Se, a representative of layered oxychalcogenides, has emerged as an air‐stable high‐mobility 2D semiconductor that holds great promise for next‐generation electronics. The preparation and device fabrication of high‐quality Bi2 O2 Se crystals down to a few atomic layers remains a great challenge at present. Here, molecular beam epitaxy (MBE) of atomically thin Bi2 O2 Se films down to monolayer on SrTiO3 (001) substrate is achieved by co‐evaporating Bi and Se precursors in oxygen atmosphere. The interfacial atomic arrangements of MBE‐grown Bi2 O2 Se/SrTiO3 are unambiguously revealed, showing an atomically sharp interface and atom‐to‐atom alignment. Importantly, the electronic band structures of one‐unit‐cell (1‐UC) thick Bi2 O2 Se films are observed by angle‐resolved photoemission spectroscopy (ARPES), showing low effective mass of ≈0.15 m 0 and bandgap of ≈0.8 eV. These results may be constructive to the synthesis of other 2D oxychalcogenides and investigation of novel physical properties. Abstract : Ultrathin Bi2 O2 Se films down to monolayer thickness are grown on a SrTiO3 (001) substrate via molecular beam epitaxy (MBE), and an atomically sharp interface between Bi2 O2 Se and SrTiO3 can be observed. Furthermore, the electronic band structures of one‐unit‐cell (1‐UC) Bi2 O2 Se films are observed, revealing a low effective mass of 0.15 m 0 and very slight bandgap enlargement compared to the bulk. … (more)
- Is Part Of:
- Advanced materials. Volume 31:Issue 39(2019)
- Journal:
- Advanced materials
- Issue:
- Volume 31:Issue 39(2019)
- Issue Display:
- Volume 31, Issue 39 (2019)
- Year:
- 2019
- Volume:
- 31
- Issue:
- 39
- Issue Sort Value:
- 2019-0031-0039-0000
- Page Start:
- n/a
- Page End:
- n/a
- Publication Date:
- 2019-08-07
- Subjects:
- 2D materials -- Bi2O2Se -- molecular beam epitaxy -- oxychalcogenides -- ultrathin films
Materials -- Periodicals
Chemical vapor deposition -- Periodicals
620.11 - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1521-4095 ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/adma.201901964 ↗
- Languages:
- English
- ISSNs:
- 0935-9648
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 0696.897800
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 11769.xml