Influence of MoS2‐Silicon Interface States on Spectral Photoresponse Characteristics. Issue 18 (15th July 2019)
- Record Type:
- Journal Article
- Title:
- Influence of MoS2‐Silicon Interface States on Spectral Photoresponse Characteristics. Issue 18 (15th July 2019)
- Main Title:
- Influence of MoS2‐Silicon Interface States on Spectral Photoresponse Characteristics
- Authors:
- Desai, Pradeep
Ranade, Ajinkya K.
Mahyavanshi, Rakesh
Tanemura, Masaki
Kalita, Golap - Abstract:
- Abstract : Fabrication of heterojunction with transition metal dichalcogenide (TMDC) layers and convention bulk semiconductor is of great interest for optoelectronic device applications. Herein, the influence of interface in a fabricated molybdenum sulfide (MoS2 ) and p‐type silicon (Si) heterostructure on bias‐dependent photoresponse is demonstrated. The MoS2 layers deposited on the p‐type Si wafer show a photovoltaic action and a photoresponsivity of 139 mA W −1 at 860 nm wavelength for a bias voltage of −5 V. It is observed that the spectral photoresponse of the device enhanced considerably with an applied bias voltage than that of the photovoltaic mode due to an effective field effect across the heterojunction. The increase in photoresponsivity at a higher wavelength (>600 nm) is significant than that of lower wavelength (<500 nm) at the bias voltage. This may due to surface recombination of photocarriers for higher energy photons in the presence of interface states at the MoS2 /Si heterojunction. The understanding of photocarriers behavior in the fabricated MoS2 /Si heterojunction interface can be critical to develop high photoresponsive heterojunction devices. Abstract : Herein, the influence of interface in a MoS2 /silicon heterostructure on bias‐dependent photoresponse is demonstrated. It is observed that the spectral photoresponse of the device enhanced with an applied bias voltage due to an effective field effect. The increase in photoresponsivity at a higherAbstract : Fabrication of heterojunction with transition metal dichalcogenide (TMDC) layers and convention bulk semiconductor is of great interest for optoelectronic device applications. Herein, the influence of interface in a fabricated molybdenum sulfide (MoS2 ) and p‐type silicon (Si) heterostructure on bias‐dependent photoresponse is demonstrated. The MoS2 layers deposited on the p‐type Si wafer show a photovoltaic action and a photoresponsivity of 139 mA W −1 at 860 nm wavelength for a bias voltage of −5 V. It is observed that the spectral photoresponse of the device enhanced considerably with an applied bias voltage than that of the photovoltaic mode due to an effective field effect across the heterojunction. The increase in photoresponsivity at a higher wavelength (>600 nm) is significant than that of lower wavelength (<500 nm) at the bias voltage. This may due to surface recombination of photocarriers for higher energy photons in the presence of interface states at the MoS2 /Si heterojunction. The understanding of photocarriers behavior in the fabricated MoS2 /Si heterojunction interface can be critical to develop high photoresponsive heterojunction devices. Abstract : Herein, the influence of interface in a MoS2 /silicon heterostructure on bias‐dependent photoresponse is demonstrated. It is observed that the spectral photoresponse of the device enhanced with an applied bias voltage due to an effective field effect. The increase in photoresponsivity at a higher wavelength is significant than that of lower wavelength indicating the recombination of photocarriers in the presence of interface states. … (more)
- Is Part Of:
- Physica status solidi. Volume 216:Issue 18(2019)
- Journal:
- Physica status solidi
- Issue:
- Volume 216:Issue 18(2019)
- Issue Display:
- Volume 216, Issue 18 (2019)
- Year:
- 2019
- Volume:
- 216
- Issue:
- 18
- Issue Sort Value:
- 2019-0216-0018-0000
- Page Start:
- n/a
- Page End:
- n/a
- Publication Date:
- 2019-07-15
- Subjects:
- heterojunction -- interfaces -- photoresponsivity -- spectral response
Solid state physics -- Periodicals
Solids -- Industrial applications -- Periodicals
530.41 - Journal URLs:
- http://onlinelibrary.wiley.com/ ↗
- DOI:
- 10.1002/pssa.201900349 ↗
- Languages:
- English
- ISSNs:
- 1862-6300
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 6475.210000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 11689.xml