Cite
HARVARD Citation
Nagasawa, R. et al. (n.d.). Acceleration of metal-atom diffusion in electric field at metal/insulator interfaces: First-principles study. Japanese journal of applied physics. p. . [Online].
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Nagasawa, R. et al. (n.d.). Acceleration of metal-atom diffusion in electric field at metal/insulator interfaces: First-principles study. Japanese journal of applied physics. p. . [Online].