Cite
HARVARD Citation
Ozaki, Y. et al. (n.d.). Elemental depth profiles and plasma etching rates of positive-tone electron beam resists after sequential infiltration synthesis of alumina. Japanese journal of applied physics. p. . [Online].
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Ozaki, Y. et al. (n.d.). Elemental depth profiles and plasma etching rates of positive-tone electron beam resists after sequential infiltration synthesis of alumina. Japanese journal of applied physics. p. . [Online].