Cite
HARVARD Citation
Pandey, K. et al. (2019). Surface roughness modeling in chemically etched polishing of Si (100) using double disk magnetic abrasive finishing. Machining science and technology. 23 (5), pp. 824-846. [Online].
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Pandey, K. et al. (2019). Surface roughness modeling in chemically etched polishing of Si (100) using double disk magnetic abrasive finishing. Machining science and technology. 23 (5), pp. 824-846. [Online].