Cite
HARVARD Citation
Rond, C. et al. (n.d.). Chemical analysis of H2–B2H6 and H2–CH4–B2H6 microwave CVD plasmas used for diamond deposition. Plasma sources science & technology. p. . [Online].
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Rond, C. et al. (n.d.). Chemical analysis of H2–B2H6 and H2–CH4–B2H6 microwave CVD plasmas used for diamond deposition. Plasma sources science & technology. p. . [Online].