Cite
HARVARD Citation
Liu, C. et al. (2015). Effect of oxygen partial pressure on properties of ZnO/Al thin films prepared by pulsed dc reactive magnetron sputtering with SpeedFlo controller. Materials technology. pp. 249-256. [Online].
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Liu, C. et al. (2015). Effect of oxygen partial pressure on properties of ZnO/Al thin films prepared by pulsed dc reactive magnetron sputtering with SpeedFlo controller. Materials technology. pp. 249-256. [Online].