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HARVARD Citation
Kim, H. et al. (n.d.). Numerical analysis of the effect of electrode spacing on deposition rate profiles in a capacitively coupled plasma reactor. Plasma sources science & technology. p. . [Online].
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Kim, H. et al. (n.d.). Numerical analysis of the effect of electrode spacing on deposition rate profiles in a capacitively coupled plasma reactor. Plasma sources science & technology. p. . [Online].