Cite
HARVARD Citation
Li, M. et al. (2019). Critical thickness of GaN film in controllable stress-induced self-separation for preparing native GaN substrates. Materials & design. p. . [Online].
This is an interim version of our Electronic Legal Deposit Catalogue-eJournals and eBooks while we continue to recover from a cyber-attack.
Li, M. et al. (2019). Critical thickness of GaN film in controllable stress-induced self-separation for preparing native GaN substrates. Materials & design. p. . [Online].