Targeted Exfoliation and Reassembly of Polymeric Carbon Nitride for Efficient Photocatalysis. (14th May 2019)

• Record Type: Journal Article
• Authors: Li, Yunxiang; Ouyang, Shuxin; Xu, Hua; Hou, Weishu; Zhao, Ming; Chen, Huayu; Ye, Jinhua
• Is Part Of: Advanced functional materials. Volume 29:Number 27(2019)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2019-05-14
• Subjects: 2D materials -- carbon nitride -- exfoliation -- photocatalysis -- reassembly; Materials -- Periodicals; Chemical vapor deposition -- Periodicals; 620.11
• DOI: 10.1002/adfm.201901024
• Languages: English
• ISSNs: 1616-301X

Abstract

Abstract: Switching the properties of photocatalytic materials targetedly and exerting these advantages fully in different photoredox reactions are crucial for the sufficient utilization of solar energy but still presents a significant challenge. This study presents a facile, green, and reversible exfoliation–reassembly strategy to switch the features of polymeric carbon nitride (CN) favorably for different photoredox reactions. The giant expansion effect of in situ‐generated H2 O molecules confined to the interlayer results in the mass production of ultrathin polymeric CN nanosheets, giving a high yield, i.e., up to 48%, of ultrathin nanosheets in a mild solution (pH ≈1.3). Interestingly, the exfoliation–reassembly process as well as the properties of CN are largely reversible via alternating the interlayer groups. Moreover, the exfoliated and reassembled CN achieve a superior photocatalytic activity for isopropanol degradation (acetone: 345 µmol h −1 ; CO2 : 23 µmol h −1 ) and H2 evolution (1370 µmol h −1 ), resulting in a high apparent quantum yield of 27% and 46%, respectively, at ≈420 nm. Abstract : A reversible exfoliation–reassembly functionalized polymeric carbon nitride with switchable properties is developed to exert its advantages in different photoredox reactions. The exfoliated and reassembled carbon nitride with tunable and favorable features achieves a high apparent quantum yield of 27% and 46% for photocatalytic isopropanol oxidation and H2 generation, respectively, at ≈420 nm.