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HARVARD Citation
Ning, H. et al. (n.d.). 35.3: Self‐formed nano‐scale metal‐oxide contact interlayer for amorphous silicon tin oxide TFTs. Digest of technical papers. pp. 385-394. [Online].
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Ning, H. et al. (n.d.). 35.3: Self‐formed nano‐scale metal‐oxide contact interlayer for amorphous silicon tin oxide TFTs. Digest of technical papers. pp. 385-394. [Online].