31.1: Invited Paper: Monochromatic Active Matrix Micro‐LED Micro‐Displays with >5, 000 dpi Pixel Density Fabricated using Monolithic Hybrid Integration Process. (28th November 2018)

• Record Type: Journal Article
• Authors: Zhang, Lei; Ou, Fang; Chong, Wing Cheung; Chen, Yijing; Zhu, Yuankun; Li, Qiming
• Is Part Of: Digest of technical papers. Volume 49(2018)Supplement 1
• Page Start: 333
• Page End: 336
• Publication Date: 2018-11-28
• Subjects: Micro-LEDs -- Hybrid monolithic integration -- Micro-display; Information display systems -- Congresses; 621.3815422
• DOI: 10.1002/sdtp.12718
• Languages: English
• ISSNs: 0097-966X

Abstract

Abstract : Wafer‐scale epi‐transfer process has been developed for monolithic hybrid integration of Si‐based IC and micro‐LED arrays. Monochromatic red, green, and blue Active‐Matrix micro‐LED (AMmLED) micro‐displays with a resolution of 5000+ PPI were demonstrated for the first time by JBD using this wafer‐scale monolithic hybrid integration technology, which shows feasibility and advantages for low cost mass productions. The brightness of the demonstrated AMμLED micro‐display (green) well exceeds 5x105cd/m2, representing an improvement of over 500‐times compared to the existing self‐emissive micro‐displays. The ultra‐high pixel resolution, high brightness and contrast ratio, low power consumption, and small footprint makes AMμLED micro‐displays highly desirable for various wearable electronics and AR applications.